

Degree
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博士(工学) ( 大阪大学 )
Research Interests
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酸化物半導体
Research Areas
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Nanotechnology/Materials / Thin film/surface and interfacial physical properties
Qualification acquired
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衛生工学衛生管理者
Presentations
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Transparent thin films of ZnO:Ga prepared by multi-cathode-reactive sputtering
Y. Takimoto, Y.Haramoto, A.Tokunaga, Y.Yoshioka, A.Uemura
2011.9
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SnO2:Al thin films prepared by rf-magnetron sputtering
H.Maehisa, R.Masuhara, T.Tsumura, A.Uemura
2011.9
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ZnO:Ga,N thin films prepared by multi-cathode-reactive sputtering
T. Doi, H. Matsugasaki, Y. Takimoto, Y. Haramoto, A. Uemura
2012.9
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SnO2:Ga thin films prepared by rf-magnetron sputtering
K.Nobuo, M.Kondo, M.Yokose, H.Maehisa, R.Masuhara, T.Tsumura, A.Uemura
2012.9
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Effect of initial surface of Zn target on electrical characteristics of ZnO:Ga,N thin films prepared by reactive sputtering
R. Takahashi, T. Doi, H. Matsugasaki, A. Uemura
2013.9
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Electrical properties of SnO2:Ga thin films prepared by rf-magnetron sputtering
Y. Takano, A .Mori, K. Nobuo, M. Kondo, M. Yokose, A. Uemura
2013.9
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Effect of SiO2 capping layer on ZnO thin films
T. Mitani, K. Oomura, M. Harada, H. Matsumoto, A. Uemura
2016.9
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Electrical properties of SnO2:N thin films prepared by radio-frequency magnetron sputtering
UEMURA Akira
T. Kamigaki, S. Hayashi, Y. Ishikawa, S. Yoshida, H. Sato, A. Uemura 2016.9
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Effect of UV Irradiation in the Current-voltage Characteristics of Sputtered ZnO: P / ZnO: Ga thin Films
H.Umebara, N.Tuda, A.Uemura
SJCIEE 2017: Shikoku-section Joint Convention of the Institutes of Electrical and related Engineers. 2017.9
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Substrate-temperature dependence of ZnO: P / ITO thin films
H. Umebara, D. Nakado, A. Uemura
SJCIEE 2018: Shikoku-section Joint Convention of the Institutes of Electrical and related Engineers. 2018.9
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Current-voltage characteristics of SnO₂:N thin films
T. Kodani, S. Yamasaki, A. Uemura
SJCIEE 2018: Shikoku-section Joint Convention of the Institutes of Electrical and related Engineers. 2018.9